AS ISO 17560-2006

Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

Standards Australia , 10/20/2006

Publisher: AS

File Format: PDF

$25.00$50.00

Description

Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.

Published: 10/20/2006

Pages: 10

File Size: 1 file , 770 KB

ISBN: 0733777872

Language: English

Note: This product is unavailable in Ukraine, Russia, Belarus